Mars 4420 is a high-speed, automated defect detection equipment for SiC polished substrates and homogeneous epitaxial wafers. The device adopts multiple methods such as differential interference, photoluminescence, and dark field scattering for detection. It can automatically focus in real time and collect data through multiple channels, with advantages such as low noise and high-resolution imaging. It adopts deep learning based automatic defect detection algorithms, and wafer detection and data analysis can be processed in parallel, meeting the needs of production inspection and device yield improvement for standard 4, 6, and 8-inch SiC wafers and non-standard size wafers.
Product parameters:
Application scope: Defect detection and analysis of SiC polished substrates and homogeneous epitaxial wafers
Measurable chip size: Supports 4, 6, 8 inches and other non-standard sizes
Detection channel: Bright field, dark field, dual PL, simultaneous detection
Contact:
Company Email：service@zdkfh-ie.com
Contact Number：0351--6523746
