Mars 4410 is an automatic defect detection equipment for SiC substrate wafers, homoepitaxial wafers and corroded wafers. The equipment adopts various detection methods such as differential interference phase contrast and photoluminescence, and has the advantages of low noise and high resolution imaging, high detection throughput and high detection rate, etc. Wafer detection and data analysis are processed in parallel, wafer defects and device failures It is related to meet the demand for improving the yield rate of SiC wafers.
Product parameters:
Scope of application: Defect detection and analysis of SiC polished substrates, homoepitaxial wafers, and corroded wafers
Measurable wafer size: 4, 6, 8 inches
Contact:
Company Email：service@zdkfh-ie.com
Contact Number：0351--6523746
